METHOD OF FORMING DUAL EXPOSURE GLASS LAYER STRUCTURES

摘要

Nano structures are formed in a glass layer on a substrate by defining a first structure in the glass layer using a low energy radiation exposure, and then defining a second structure in the glass layer for the dynamic layer using a higher energy radiation exposure. The structures are then developed in TMAH. The structures include at least sensors and nano-channels. Densification is performed by converting the structures to SiO2. Further structures are formed by using different energy exposures. One structure is a channel having a porous wall prior to development.