发明名称 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
摘要 A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
申请公布号 US2004115032(A1) 申请公布日期 2004.06.17
申请号 US20030713339 申请日期 2003.11.14
申请人 OSTERMANN RAINER;BUECHEL ARTHUR;ELYAAKOUBI MUSTAPHA 发明人 OSTERMANN RAINER;BUECHEL ARTHUR;ELYAAKOUBI MUSTAPHA
分类号 B65G1/00;C23C14/56;C23C16/54;F27B17/00;F27D3/00;F27D3/06;H01L21/00;H01L21/677;(IPC1-7):B65G1/00 主分类号 B65G1/00
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