| 摘要 |
The invention relates to a method for producing a microelectromechanical system (MEMS) which comprises a sensor and CMOS technology-based electronics for processing the sensor signal, both being monolithically integrated in said system. To fulfil the pre-requisites for producing the electronic part (4) of the sensor (5) and the signal processing electronics using CMOS technology, a semiconductor wafer (2) containing a depression is bonded to a wafer with an epitaxial layer by means of said layer (3) using high-temperature fusion bonding, to form a double wafer and material is subsequently removed from one face of the double wafer. The latter is then polished until the epitaxial layer is exposed, thus creating a membrane (3a). |
