发明名称 Electrical contact with dual electrical paths
摘要 An electrical contact (1) for electrically interconnecting two electrical interfaces (31, 41) includes a retention portion (11), an extending portion extending (12) from one end of the invention, and a second engaging portion (114) extending from the other end of the retention portion. The extending portion defines first and second mating portions (122, 121) respectively at uppermost and lowermost portions thereof, for respectively engaging with the electrical interfaces. The extending portion forms a first engaging portion (125) to mate with the second engaging portion. Thus two parallel electric paths are formed between the first and second mating portions when the contact electrically mats with the two electrical interface. As a result, impedance of the contact is decreased and gain good resilient characteristics.
申请公布号 US6749440(B1) 申请公布日期 2004.06.15
申请号 US20030635626 申请日期 2003.08.05
申请人 HON HAI PRECISION IND. CO., LTD. 发明人 SZU MING-LUN;LIAO FANG-JWU
分类号 H01R12/04;H01R13/24;H05K7/10;(IPC1-7):H01R12/00 主分类号 H01R12/04
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