发明名称 Semiconductor laminated substrate, semiconductor crystal substrate and semiconductor device and method of manufacturing the same
摘要 A semiconductor crystal layer composed of GaN is grown on a base substrate composed of sapphire sandwiching a separating layer composed of AlN and a buffer layer composed of GaN. The separating layers and the buffer layers are distributed in the form of lines, and a flow-through hole for an etchant is formed in the side of these layers sandwiching an anti-growing film composed of SiO2. Thus, the etchant flows through the flow-through hole, the anti-growing film and the separating layer are etched, and the base substrate is easily isolated.
申请公布号 US6750481(B2) 申请公布日期 2004.06.15
申请号 US20020098322 申请日期 2002.03.15
申请人 SONY CORPORATION 发明人 KAWAI HIROJI
分类号 C30B29/38;H01L21/00;H01L21/20;H01L21/331;H01L21/335;H01L29/20;H01L29/205;H01L33/00;H01L33/06;H01L33/12;H01L33/20;H01L33/32;H01S5/02;H01S5/323;(IPC1-7):H01L31/032 主分类号 C30B29/38
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