发明名称 |
Method and apparatus for MOCVD growth of compounds including GaAsN alloys using an ammonia precursor with a catalyst |
摘要 |
A method of using ammonia to form a GaAs alloy with nitrogen atoms is described. The method includes the operation of introducing ammonia with an agent to assist in the breakdown of the ammonia into a reaction chamber with the GaAs film. Agents that are described include radiation as well as compounds that include aluminum.
|
申请公布号 |
US6750120(B1) |
申请公布日期 |
2004.06.15 |
申请号 |
US20020317762 |
申请日期 |
2002.12.12 |
申请人 |
XEROX CORPORATION |
发明人 |
KNEISSL MICHAEL A.;TREAT DAVID W. |
分类号 |
C23C16/34;C30B25/02;C30B29/40;H01L21/20;H01L21/205;H01L31/18;H01S5/042;H01S5/343;(IPC1-7):H01L21/20 |
主分类号 |
C23C16/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|