发明名称 Method and apparatus for MOCVD growth of compounds including GaAsN alloys using an ammonia precursor with a catalyst
摘要 A method of using ammonia to form a GaAs alloy with nitrogen atoms is described. The method includes the operation of introducing ammonia with an agent to assist in the breakdown of the ammonia into a reaction chamber with the GaAs film. Agents that are described include radiation as well as compounds that include aluminum.
申请公布号 US6750120(B1) 申请公布日期 2004.06.15
申请号 US20020317762 申请日期 2002.12.12
申请人 XEROX CORPORATION 发明人 KNEISSL MICHAEL A.;TREAT DAVID W.
分类号 C23C16/34;C30B25/02;C30B29/40;H01L21/20;H01L21/205;H01L31/18;H01S5/042;H01S5/343;(IPC1-7):H01L21/20 主分类号 C23C16/34
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