发明名称 High-voltage semiconductor device
摘要 A high-voltage semiconductor device includes: a drain region; a metal electrode electrically connected to the drain region; and electrically floating plate electrodes formed on a field insulating film over a semiconductor regionm. Parts of the metal electrodes are extended onto the interlevel dielectric film and located over the respective plate electrodes. Each part of the metal electrode is capacitively coupled to associated one of the plate electrodes.
申请公布号 US6750506(B2) 申请公布日期 2004.06.15
申请号 US20000736230 申请日期 2000.12.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 NODA MASAAKI;IKUTA TERUHISA
分类号 H01L29/06;H01L29/40;H01L29/417;H01L29/78;(IPC1-7):H01L27/108;H01L29/76 主分类号 H01L29/06
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