发明名称 |
MASK FOR FORMING FLOATING GATE OF FLASH MEMORY AND METHOD FOR FABRICATING FLASH MEMORY BY USING THE SAME |
摘要 |
PURPOSE: A flash memory is provided to increase a gate capacitive coupling ratio by increasing the contact area between a floating gate and a control gate in fabricating a NAND-type flash memory. CONSTITUTION: Quartz is prepared. A plurality of line patterns are formed in the quartz, composed of a plurality of chrome patterns that are separated from each other by an interval of the first space. The line patterns are separated by the second space greater than the width of the first space.
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申请公布号 |
KR20040049902(A) |
申请公布日期 |
2004.06.14 |
申请号 |
KR20020076864 |
申请日期 |
2002.12.05 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
CHOI, CHEOL CHAN;SHIN, SEONG HUN |
分类号 |
H01L21/8247;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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