发明名称 HETERO-JUNCTION BIPOLAR TRANSISTOR AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A HBT(hetero-junction bipolar transistor) is provided to embody low metal contact resistance and base resistance and improve a cut-off frequency and maximum resonant frequency by forming an outer base layer of a superhigh density through an ion implantation process. CONSTITUTION: A substrate(1) is prepared. A collector layer(3) is formed on the substrate. A base layer is formed on the collector layer. An emitter layer pattern is patterned on the base layer. An emitter metal pattern(6a) is formed on the emitter layer pattern. A base metal pattern(6b) is formed on the base layer, separated from the emitter metal pattern by a predetermined interval. An insulation sidewall(7a) is formed between the emitter metal pattern and the base metal pattern.
申请公布号 KR20040049527(A) 申请公布日期 2004.06.12
申请号 KR20020077325 申请日期 2002.12.06
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, HONG SEUNG;KIM, HYE JIN;LIM, JONG WON;NAM, EUN SU
分类号 H01L29/737;(IPC1-7):H01L29/737 主分类号 H01L29/737
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