发明名称 |
HETERO-JUNCTION BIPOLAR TRANSISTOR AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A HBT(hetero-junction bipolar transistor) is provided to embody low metal contact resistance and base resistance and improve a cut-off frequency and maximum resonant frequency by forming an outer base layer of a superhigh density through an ion implantation process. CONSTITUTION: A substrate(1) is prepared. A collector layer(3) is formed on the substrate. A base layer is formed on the collector layer. An emitter layer pattern is patterned on the base layer. An emitter metal pattern(6a) is formed on the emitter layer pattern. A base metal pattern(6b) is formed on the base layer, separated from the emitter metal pattern by a predetermined interval. An insulation sidewall(7a) is formed between the emitter metal pattern and the base metal pattern.
|
申请公布号 |
KR20040049527(A) |
申请公布日期 |
2004.06.12 |
申请号 |
KR20020077325 |
申请日期 |
2002.12.06 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KIM, HONG SEUNG;KIM, HYE JIN;LIM, JONG WON;NAM, EUN SU |
分类号 |
H01L29/737;(IPC1-7):H01L29/737 |
主分类号 |
H01L29/737 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|