ATOMIC LAYER DEPOSITION(ALD) EQUIPMENT CAPABLE OF PREVENTING GENERATION OF POWDER IN EXHAUST PATH

摘要

PURPOSE: ALD(Atomic Layer Deposition) equipment capable of preventing the generation of powder in an exhaust path is provided to prevent a variety of reactants from meeting with each other. CONSTITUTION: ALD equipment is provided with a reaction part(100), a plurality of reactant supply parts(151,155) for alternately supplying reactants to the reaction part, a plurality of exhaust paths installed as many as the same number as the kinds of reactants for independently exhausting each reactant, and exhaust control valves for selectively switching the exhaust paths. Preferably, exhaust paths include pumps(210,250), scrubbers(310,350) installed at the rear end portions of the pumps and exhaust lines(410,431,433,451,453,491,493) for connecting the pumps with the scrubbers and the reaction part.