发明名称 |
Atomic layer deposition apparatus and method for preventing generation of solids in exhaust path |
摘要 |
Provided is an atomic layer deposition (ALD) apparatus in which the generation of powders is suppressed by providing a largely dedicated exhaust path for each of the reactants utilized in the ALD process. The ALD apparatus includes a reactor in which an ALD process is performed on a wafer using two or more types of reactants; reactant suppliers, each of which alternately supplies a different reactant to the reactor; and an exhaust path for each type of reactant so that the non-reacted portion of the reactants removed from the reaction chamber do not mix and react in the exhaust path.
|
申请公布号 |
US2004107897(A1) |
申请公布日期 |
2004.06.10 |
申请号 |
US20030640244 |
申请日期 |
2003.08.14 |
申请人 |
LEE SEUNG-HWAN;CHU KANG-SOO;LEE JOO-WON;PARK JAE-EUN;YANG JONG-HO |
发明人 |
LEE SEUNG-HWAN;CHU KANG-SOO;LEE JOO-WON;PARK JAE-EUN;YANG JONG-HO |
分类号 |
C23C14/54;C23C14/24;C23C16/44;C23C16/455;C30B25/14;H01L21/20;H01L21/205;(IPC1-7):C30B1/00 |
主分类号 |
C23C14/54 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|