发明名称 Linear drive system for use in a plasma processing system
摘要 A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
申请公布号 US2004108301(A1) 申请公布日期 2004.06.10
申请号 US20030702682 申请日期 2003.11.05
申请人 HAO FANGLI;DAWSON KEITH;LENZ ERIC H. 发明人 HAO FANGLI;DAWSON KEITH;LENZ ERIC H.
分类号 H05H1/46;C23C16/509;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01L21/302 主分类号 H05H1/46
代理机构 代理人
主权项
地址