发明名称 |
Linear drive system for use in a plasma processing system |
摘要 |
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
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申请公布号 |
US2004108301(A1) |
申请公布日期 |
2004.06.10 |
申请号 |
US20030702682 |
申请日期 |
2003.11.05 |
申请人 |
HAO FANGLI;DAWSON KEITH;LENZ ERIC H. |
发明人 |
HAO FANGLI;DAWSON KEITH;LENZ ERIC H. |
分类号 |
H05H1/46;C23C16/509;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01L21/302 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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