| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of forming transparent curing resin patterns which are free of coloring and have a high transmittance to visible light and sufficient solvent resistance and capable of forming the transparent curing resin patterns of a good shape. <P>SOLUTION: The radiation sensitive resin composition contains a copolymer (A) including a constitutional unit (a1) derived from unsaturated carboxylic acid and a constitutional unit (a2) derived from an unsaturated compound having an oxetanyl group (precluding the unsaturated carboxylic acid) as a binder resin, a quinonediazido compound (B), and a salt consisting of hexafluoroantimonate anion and onium cation as a cation polymerization initiator (C). <P>COPYRIGHT: (C)2004,JPO |
