发明名称 DEVICE AND METHOD FOR CONTROLLING TREATING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method for controlling a treating apparatus by which a mean value within a certain definite period of time can be controlled below a prescribed value even when the process value temporarily deviates from a set value because of sudden change of the process value or the like and the consumption of a reducing agent such as ammonia can be suppressed to the minimum. <P>SOLUTION: The device for controlling a treating apparatus is provided with an additive controller 12 for controlling flow rate of the additive supplied to the treating apparatus, a concentration detector 14 for detecting residual concentration of a material to be treated at a downstream side of the treating apparatus or concentration of a product produced by reaction of the material to be treated and the additive, an instantaneous value control circuit 16 for controlling the additive controller so as to put a value A measured by the concentration detector near to a prescribed instantaneous value controlling set value B, and a time average control circuit 18 which performs biased operation to the instantaneous value controlling set value B so as to put a mean of the measured values A near to a prescribed time average controlling set value C within a prescribed time T. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004160311(A) 申请公布日期 2004.06.10
申请号 JP20020327393 申请日期 2002.11.11
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 AKAGI HIROTOKI
分类号 B01D53/56;B01D53/74;B01D53/86;B01D53/94 主分类号 B01D53/56
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