发明名称 YTTRIUM-DOPED BISMUTH TITANATE THIN FILM AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a BYT thin film made by doping BTO with yttrium and to provide a method for producing the same. SOLUTION: The BYT thin film having a composition of Bi<SB>4-x</SB>Y<SB>x</SB>Ti<SB>3</SB>O<SB>12</SB>is improved in a polarization value and electrical fatigue properties, has excellent ferromagnetic properties. It is therefore usefully used as e.g., an FRAM (ferroelectric random access memory) element having a high speed, a large capacity, a low electric consumption, and nonvolatile properties. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004162175(A) 申请公布日期 2004.06.10
申请号 JP20030334481 申请日期 2003.09.26
申请人 POHANG ENG COLLEGE 发明人 RI JIU;KANG SANG-WOO
分类号 C01G29/00;C04B35/475;C23C16/40;C23C16/56;H01B3/10;H01B3/12;H01L21/314;H01L21/316;H01L21/8246;H01L27/105;(IPC1-7):C23C16/40 主分类号 C01G29/00
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