发明名称 LOCAL CLEANING TRANSFER CHAMBER AND LOCAL CLEANING TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a local cleaning transfer chamber and local cleaning treatment equipment that can easily adjust atmospheric pressure inside a transfer room and maintain a clean environment without sharply increasing the amount of blast. SOLUTION: The local cleaning transfer chamber comprises a number of openings that are provided on the floor surface of a wafer transfer chamber while a hand ring unit is sandwiched and discharge air from a fan filter unit, and an opening ratio adjustment mechanism that covers at least one portion of the openings and adjusts the opening ratio. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004165331(A) 申请公布日期 2004.06.10
申请号 JP20020327885 申请日期 2002.11.12
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 KUSHIDA MINORU
分类号 B65G49/00;F24F7/06;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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