发明名称 |
LOCAL CLEANING TRANSFER CHAMBER AND LOCAL CLEANING TREATMENT EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a local cleaning transfer chamber and local cleaning treatment equipment that can easily adjust atmospheric pressure inside a transfer room and maintain a clean environment without sharply increasing the amount of blast. SOLUTION: The local cleaning transfer chamber comprises a number of openings that are provided on the floor surface of a wafer transfer chamber while a hand ring unit is sandwiched and discharge air from a fan filter unit, and an opening ratio adjustment mechanism that covers at least one portion of the openings and adjusts the opening ratio. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004165331(A) |
申请公布日期 |
2004.06.10 |
申请号 |
JP20020327885 |
申请日期 |
2002.11.12 |
申请人 |
HITACHI ELECTRONICS ENG CO LTD |
发明人 |
KUSHIDA MINORU |
分类号 |
B65G49/00;F24F7/06;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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