发明名称 METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display device which prevents contact between Al and ITO (Indium Tin Oxide) for higher reliability of elements. SOLUTION: The method for manufacturing the liquid crystal display device includes stages of: respectively forming gate electrodes and gate pads 2 respectively on a substrate; successively forming an insulating film and a semiconductor film over the entire surface of the substrate; forming semiconductor film patterns to transistor (TR) sections 5 by secondary photoetching of the semiconductor film; forming a metallic film over the entire surface of the substrate; forming source electrodes and drain electrodes in the TR sections 5 by ternary photoetching of the metallic film 5; and forming a protective film over the entire surface of the substrate. The method further includes stages of: opening contact holes for exposing the drain electrode surfaces and gate pad 2 surfaces to a side inner than the gate pads 2 by quaternary photoetching of the protective film and the insulating film; forming an ITO film over the entire surface of the substrate formed with the contact holes; and forming pixel electrodes 6 connected to the drain electrodes and the gate pads 2 by quinary photoetching of the ITO film. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004163968(A) 申请公布日期 2004.06.10
申请号 JP20040002173 申请日期 2004.01.07
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM DONG-GYO;LEE WEON-HYI
分类号 G02F1/1343;G02F1/1345;G02F1/136;G02F1/1362;G02F1/1368;H01L21/28;H01L21/336;H01L29/423;H01L29/49;H01L29/786;(IPC1-7):G02F1/136 主分类号 G02F1/1343
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