摘要 |
<P>PROBLEM TO BE SOLVED: To provide an epitaxial growing process of a compound semiconductor capable of producing a compound semiconductor crystal having a good crystal quality. <P>SOLUTION: In the process for epitaxially growing a III-V compound semiconductor containing nitrogen in a group V element by metal organic vapor phase epitaxy, the III-V compound semiconductor is heat treated in nitrogen atmosphere following to epitaxial growth in hydrogen atmosphere. <P>COPYRIGHT: (C)2004,JPO |