发明名称 PROCESS FOR GROWING COMPOUND SEMICONDUCTOR EPITAXIALLY AND PROCESS FOR FABRICATING LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an epitaxial growing process of a compound semiconductor capable of producing a compound semiconductor crystal having a good crystal quality. <P>SOLUTION: In the process for epitaxially growing a III-V compound semiconductor containing nitrogen in a group V element by metal organic vapor phase epitaxy, the III-V compound semiconductor is heat treated in nitrogen atmosphere following to epitaxial growth in hydrogen atmosphere. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004165349(A) 申请公布日期 2004.06.10
申请号 JP20020328344 申请日期 2002.11.12
申请人 SEIKO EPSON CORP 发明人 NISHIDA TETSURO
分类号 H01L21/205;H01L33/32;H01S5/223;H01S5/323 主分类号 H01L21/205
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