| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus. <P>SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid. <P>COPYRIGHT: (C)2004,JPO |
