发明名称 |
Heating apparatus which has electrostatic adsorption function, and method for producing it |
摘要 |
There is disclosed a heating apparatus which has an electrostatic adsorption function and which comprises at least a supporting substrate, an electrode for electrostatic adsorption formed on a surface of one side of the supporting substrate, a heating layer formed on a surface of the other side of the supporting substrate, and an insulating layer formed so that it may cover the electrode for electrostatic adsorption and the heating layer wherein a volume resistivity of the insulating layer is varied in a plane. Thus, there can be provided a heating apparatus which has an electrostatic adsorption function wherein uniformity of a temperature distribution in a plane of the wafer when the wafer is heated can be improved, and the wafer can be heat-treated uniformly.
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申请公布号 |
US2004108314(A1) |
申请公布日期 |
2004.06.10 |
申请号 |
US20030695870 |
申请日期 |
2003.10.30 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KANO SHOJI;SATOH KENJI;ITO KENJI |
分类号 |
H05B3/20;C23C16/26;C23C16/38;H01L21/00;H01L21/02;H01L21/68;H01L21/683;H05B3/10;H05B3/26;H05B3/74;(IPC1-7):H05B6/46;H05B6/54 |
主分类号 |
H05B3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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