<p>An exposure apparatus, wherein the pattern of a mask (M) is transferred onto a photosensitive substrate (P) by guiding a light flux emitted from a light source (1) to the mask, comprises an illumination optical system which is disposed in an optical path between the light source and the mask and illuminates the mask according to the light flux from the light source. The light source comprises a solid-state light source unit having a plurality of solid-state light sources so arranged that the luminance on the photosensitive substrate is 30 mW/cm<2> or higher.</p>
