PLASMA TREATMENT APPARATUS AND METHOD USING TEMPERATURE CONTROL PART

摘要

PURPOSE: A plasma treatment apparatus and method are provided to prevent the influence of heat on a dielectric part and to perform simultaneously plasma processing of high quality by using a temperature control part. CONSTITUTION: A plasma treatment apparatus(100) includes a vacuum chamber, a dielectric part, a plate, and a temperature control part. The vacuum chamber stores a process object body and performs plasma processing on the process object body under a vacuum or reduced pressure atmosphere. The dielectric part(17) transmits microwaves to the vacuum chamber and sustains the vacuum or reduced pressure atmosphere of the vacuum chamber. The plate(16) includes a slot for guiding the microwaves to the dielectric part. The temperature control part(22) includes a cooling path between the plate and the dielectric part. The temperature control part is used for controlling the temperature of the dielectric part.