| 摘要 |
PURPOSE: An exhaust system of semiconductor device manufacturing equipment and a method thereof are provided to prevent a variety of exhaust gases from being deposited on an exhaust line by using a heater. CONSTITUTION: An exhaust system of semiconductor device manufacturing equipment is provided with at least one pump installed on an exhaust line between a process chamber and an exhaust duct for controlling the flow of fluid, and a control valve(30). The exhaust system further includes a plurality of heaters(34a,34b) installed at the inner portion of the exhaust line for being exposed to the fluid and a control part for controlling the pump, control valve, and heater. Preferably, an insulating layer is coated on a heater installing portion.
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