发明名称 |
Surface silanization |
摘要 |
A substrate surface is plasma cleaned and silanized in a chamber. Plasma is generated in the chamber to clean the substrate surface. Gas containing an organosilane compound is introduced into the same chamber to silanized the cleaned surface. Water is deposited on the substrate surface to facilitate silane coupling reaction. A layer of covalently bonded silane molecules having functional groups is thus produced on the substrate surface. The substrate is then cured by a baking process.
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申请公布号 |
US2004107905(A1) |
申请公布日期 |
2004.06.10 |
申请号 |
US20030641829 |
申请日期 |
2003.08.14 |
申请人 |
AST PRODUCTS, INC., A DELAWARE CORPORATION |
发明人 |
SHEU MIN-SHYAN |
分类号 |
B05D3/14;B05D7/24;B08B7/00;(IPC1-7):C23C16/00 |
主分类号 |
B05D3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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