发明名称 Plasma-assisted melting
摘要 Apparatus and methods for plasma-assisted melting are provided. In one embodiment, a plasma-assisted melting method can include: (1) adding a solid to a melting region, (2) forming a plasma in a cavity by subjecting a gas to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, wherein the cavity has a wall, (3) sustaining the plasma in the cavity such that energy from the plasma passes through the wall into the melting region and melts the solid into a liquid, and (4) collecting the liquid. Solids that can be melted consistent with this invention can include metals, such as metal ore and scrap metal. Various plasma catalysts are also provided.
申请公布号 US2004107796(A1) 申请公布日期 2004.06.10
申请号 US20030449600 申请日期 2003.06.02
申请人 KUMAR SATYENDRA;KUMAR DEVENDRA 发明人 KUMAR SATYENDRA;KUMAR DEVENDRA
分类号 B23K10/00;C12N15/55;C21B13/12;C21C5/52;C22B4/00;C22B4/08;C22B9/22;C23C;F01N3/20;F01N13/10;H01J37/32;H05B6/68;H05B6/78;H05B6/80;H05H1/24;H05H1/46;(IPC1-7):C22B4/00 主分类号 B23K10/00
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