| 发明名称 |
Phase shift mask |
| 摘要 |
A phase shift mask, comprising a transparent substrate having a trench-type guard ring pattern for shifting the phase of light transmitted therethrough by 180°; and a half-tone phase shift pattern disposed on the transparent substrate and surrounded by the guard ring pattern is disclosed.
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| 申请公布号 |
US2004110071(A1) |
申请公布日期 |
2004.06.10 |
| 申请号 |
US20030608412 |
申请日期 |
2003.06.30 |
| 申请人 |
LIM CHANG MOON;KIM SEO MIN |
发明人 |
LIM CHANG MOON;KIM SEO MIN |
| 分类号 |
H01L21/027;G03F1/00;(IPC1-7):G03F9/00;B44F1/00;A47G1/12;G03C5/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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