发明名称 METHOD OF ELECTRON BEAM LITHOGRAPHY, STAMPER MOLD MANUFACTURED FROM ORIGINAL DISK PRODUCED BY METHOD OF ELECTRON BEAM LITHOGRAPHY, AND INFORMATION RECORDING MEDIUM MANUFACTURED BY USING STAMPER MOLD
摘要 PROBLEM TO BE SOLVED: To provide a method of electron beam lithography to decrease the noise component originating from the original disk of an information recording medium such as a hard disk, an optical disk and a magneto-optical disk, in particular, to decrease the noise component resulting from a rough surface region of a resist. SOLUTION: The object to be processed by electron beam lithography to produce the original disk of a medium comprises a substrate 1, a resist layer 2 and a resist surface layer 3. The resist layer 2 and the resist surface layer 3 form a single layer but are separated for convenience of explanation. After a latent image is formed by exposing the object (EB exposure), the resist surface layer 3 is removed (a rough surface region is removed) before developing. Ozone decomposition ashing treatment is employed for the removal of the resist surface layer 3 so as to avoid electrification. After the resist surface layer 3 is removed, the resist layer is developed. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004163698(A) 申请公布日期 2004.06.10
申请号 JP20020330056 申请日期 2002.11.13
申请人 RICOH CO LTD 发明人 FUJITA SHIGERU;FUJIWARA YASUHIDE
分类号 G03F7/38;G03F7/20;G03F7/40;G11B7/26;H01L21/027;(IPC1-7):G03F7/38 主分类号 G03F7/38
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