摘要 |
PROBLEM TO BE SOLVED: To provide a method of electron beam lithography to decrease the noise component originating from the original disk of an information recording medium such as a hard disk, an optical disk and a magneto-optical disk, in particular, to decrease the noise component resulting from a rough surface region of a resist. SOLUTION: The object to be processed by electron beam lithography to produce the original disk of a medium comprises a substrate 1, a resist layer 2 and a resist surface layer 3. The resist layer 2 and the resist surface layer 3 form a single layer but are separated for convenience of explanation. After a latent image is formed by exposing the object (EB exposure), the resist surface layer 3 is removed (a rough surface region is removed) before developing. Ozone decomposition ashing treatment is employed for the removal of the resist surface layer 3 so as to avoid electrification. After the resist surface layer 3 is removed, the resist layer is developed. COPYRIGHT: (C)2004,JPO |