| 摘要 |
PROBLEM TO BE SOLVED: To provide a coordinate correction method between different apparatuses which enables access to a defective position simply and precisely with a defective review system, based on coordinate information of an arbitrary defect obtained by a shape defective inspection device, and to provide an inspection method using the coordinate correction method. SOLUTION: The coordinate correction method comprises a first alignment process P10 for performing alignment of a first coordinate system of a first inspection device and a virtual on-wafer coordinate system on a first wafer, a process P20 for obtaining first correction information after the process P10, a first inspection process P30 for obtaining first position information by the first inspection device, a second alignment process P40 for performing alignment of a second coordinate system based on a second means of movement and the on-wafer coordinate system by a second inspection device, a second information obtaining process 50 for obtaining second correction information after the process 40, and a coordinates correction process for converting the first position information to the second position information based on the first correction information and the second correction information. COPYRIGHT: (C)2004,JPO
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