发明名称 DIAMOND MATERIAL COMPOUNDED OF CHEMICAL VAPOR DEPOSITION DIAMOND AND POLYCRYSTALLINE-DIAMOND, AND THE USE OF THE SAME
摘要 <p>The present invention discloses a diamond material compounded of chemical vapor deposition (CVD) diamond and polycrystalline-diamond, and the use of the same. There is three structures: 1) . CVD diamond layer is grown at the surface of polycrystalline-diamond and more than 0.001mm, to form CVDD-PCD compound body. 2). CVDD-PCD compound body is weld on the cemented carbide substrate to constitute three compound body of CVDD-PCD-WC (Co). 3). CVD diamond layer is grown at the polycrystalline-diamond surface of the polycrystalline-diamond compound body, to make three layers compound body of CVDD-PCD. Because their coeficient of thermal expansion are close to each other, and the basic structure of them both are diamond, so the problem of the adhesive force and the internal stress which is resulted from cool-heat-distorsion, can be solved at all. The material, which has excellent property, can be cosmically used to produce tools and heat transmission radiator device.</p>
申请公布号 WO2004048638(A1) 申请公布日期 2004.06.10
申请号 WO2003CN00864 申请日期 2003.10.16
申请人 CHEN, JIFENG 发明人 CHEN, JIFENG
分类号 C23C16/27;(IPC1-7):C23C16/27 主分类号 C23C16/27
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