| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a Sb-Te sputtering target which effectively prevents generation of particles, abnormal electric discharge, generation of nodules, occurrence of cracks or breakage, etc., in sputtering and of which the oxygen content is reduced; its production method; and a powder for sintering suitable for producing the sputtering target. <P>SOLUTION: The Sb-Te sputtering target has an average crystal particle size of 20μm or lower, a bending strength of 60 MPa or higher, and an oxygen content of 1,000 ppm or lower. <P>COPYRIGHT: (C)2004,JPO</p> |
