发明名称 METAL DETECTION METHOD AND DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a novel method and a novel detector capable of detecting, in a real time, metals contained in a chemical used in a semiconductor manufacturing process. SOLUTION: A sample is collected from the chemical every prescribed time, and the sample is neutralized to measure absorbance using a coloring reagent. A flow injection analytical method is applicable by the method since allowing an in-line execution over the whole process, and the presence of the metals is confirmed in the real time. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004163191(A) 申请公布日期 2004.06.10
申请号 JP20020327720 申请日期 2002.11.12
申请人 ADOTEKKU KK 发明人 SAITO TADASHI;MOTOMIZU SHOJI
分类号 G01N31/00;G01N21/64;G01N21/77;G01N21/78;G01N31/22;G01N33/20;G01N35/08;(IPC1-7):G01N31/00 主分类号 G01N31/00
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