发明名称 GAS BARRIER MULTILAYER FILM
摘要 <p>An inorganic oxide deposition layer and a gas barrier coating layer are sequentially formed on a base. The gas barrier coating layer is formed by applying a coating liquid onto the inorganic oxide deposition layer and drying it. The coating liquid contains a substance expressed by the general formula (1): Si(OR&lt;1&gt;)4 or a hydrolysate thereof, a substance expressed by the general formula (2): (R&lt;2&gt;Si(OR&lt;3&gt;)3)n or a hydrolysate thereof, (in the general formulae (1) and (2), R&lt;1&gt; and R&lt;3&gt; respectively represent CH3, C2H5, or C2H4OCH3, and R&lt;2&gt; represents an organic functional group), and a water-soluble polymer having a hydroxyl group.</p>
申请公布号 WO2004048081(A1) 申请公布日期 2004.06.10
申请号 WO2003JP14935 申请日期 2003.11.21
申请人 TOPPAN PRINTING CO., LTD.;TANAKA, TSUKASA;SASAKI, NOBORU 发明人 TANAKA, TSUKASA;SASAKI, NOBORU
分类号 C08J7/04;C09D4/00;C09D183/04;(IPC1-7):B32B9/00 主分类号 C08J7/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利