| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a deposition method for a thin film for solving problems of film stresses on a substrate. <P>SOLUTION: The film stresses on both sides of a substrate 10 are balanced by using the deposition method for the thin film for an optical element. A thin film layer composed of a specific number of layers is deposited on the upper side of the substrate 10, and a thin film layer of the same thickness is deposited on the lower side of the substrate 10, to balance film stresses of both sides of the substrate 10. <P>COPYRIGHT: (C)2004,JPO |
