| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface modifying method wherein surface modification of high-definition is performed in a short period of time by increasing concentration of desired substance from a surface of base material to be treated as far as a desired depth. SOLUTION: The method for modifying a surface of the base material to be treated by using microwave surface wave plasma has a process wherein the base material is maintained at a temperature in which substance injected into the base material by plasma treatment is not practically diffused in the base material and at a temperature in which annealing effect can be obtained, a process for introducing treatment gas containing the substance into a plasma treatment chamber, a process for generating plasma in the plasma treatment chamber, and a process wherein electron temperature of the plasma is changed at least one time. COPYRIGHT: (C)2004,JPO
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