| 摘要 |
PROBLEM TO BE SOLVED: To provide etching method/device with which a good observation face can be obtained without damaging a layer lower than the observation face of a sample. SOLUTION: An HF solution 4 is put in a chemical solution tray 3, and it is placed on a work mat 1. An etching sample 6 is placed beside the chemical solution tray 3 on the work mat 1, and a sealing cover 2 is put on the etching sample 6 and the chemical solution tray 3. The sealing cover 2 is filled with HF gas generated from the HF solution 4 and etching is performed. Etching is once terminated in short time of 15 seconds, for example. The sealing cover 2 is opened and the etching sample 6 is taken out, cleaned and dried. An etching situation is confirmed, and etching (for 15 seconds), cleaning and drying are repeated if needed. COPYRIGHT: (C)2004,JPO
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