METHOD FOR MANUFACTURING MONITORING SUBSTRATE OF MEASUREMENT EQUIPMENT

摘要

PURPOSE: A method for manufacturing a monitoring substrate of measurement equipment is provided to be capable of forming a reference sample corresponding to a variety of thin films on one semiconductor substrate for reducing the cost of the reference sample. CONSTITUTION: The first and second region are defined on a substrate(100). The second region is larger than the first region. The second and first thin film are sequentially deposited on the substrate. The first thin film pattern(140a) is formed at the first region by carrying out an etching process on the first thin film using the first etching mask pattern having the same size as the first region. The second thin film pattern(120a) is formed at the second region by carrying out an etching process on the second thin film using the second etching mask pattern having the same size as the second region.