| 摘要 |
PURPOSE: A lithographic apparatus for controlling the construction of an illumination system by obtaining information of intensity distribution in a fulfill plane without actuation of the lithographic apparatus. CONSTITUTION: The lithographic projection apparatus comprises a radiation system(Ex,IL,LA) for introducing radiation projection beam(PB); a programmable patterning unit for the projection beam; a mask table(MT) for fixing a substrate; a beam divider among a projection beam route; and a detector for detecting information of position dependent intensity distribution corresponding to the fulfill plane. The radiation system forms the position dependent intensity distribution, has a structure for supporting the patterning unit, and defines the intensity distribution based on angles of the projection beam from the patterning unit.
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