| 发明名称 |
Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 摘要 |
A fabrication technique for manufacturing an optical element is disclosed. It involves selectively plasma etching a multi-layer stack and covering the obtained relief profile with a film, for example a reflective coating. <IMAGE>
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| 申请公布号 |
EP1426821(A1) |
申请公布日期 |
2004.06.09 |
| 申请号 |
EP20030257400 |
申请日期 |
2003.11.24 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DIERICHS, MARCEL, MATHIJS, THEODORE, MARIE;LOOPSTRA, ERIK, ROELOF |
| 分类号 |
G03F1/24;G03F7/00;G21K1/06;(IPC1-7):G03F7/00;G03F1/14 |
主分类号 |
G03F1/24 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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