Reticle, and pattern positional accuracy measurement device and method

摘要

A positional accuracy measurement pattern is formed such that the position of an edge portion required to have high positional accuracy in a device pattern and the position of the pattern center of the positional accuracy measurement pattern are arranged on the same straight line in accordance with a direction in which the high positional accuracy is necessary. On the basis of the pattern center of the positional accuracy measurement pattern and the difference between the measurement value and the design value of the pattern dimension, the positional accuracy (the difference between the measurement value and the design value) of an edge portion of the device pattern is calculated.