发明名称 Method of reducing charge loss for nonvolatile memory
摘要 A method of reducing charge loss for nonvolatile memory. First, a semiconductor substrate having a semiconductor device thereon is provided. Next, a dielectric layer is formed on the entire surface of the semiconductor substrate, and a thermal treatment is performed in an atmosphere containing a reactive gas, and the reactive gas reacts with free ions remaining on the semiconductor substrate from prior manufacturing processes. Finally, a metal layer is formed on the dielectric layer.
申请公布号 US6746968(B1) 申请公布日期 2004.06.08
申请号 US20030364428 申请日期 2003.02.12
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 TSENG UWAY;CHANG CHING-YU;CHIU HUNG-YU;LU WENPIN
分类号 H01L21/28;H01L21/306;H01L21/3105;(IPC1-7):H01L21/31 主分类号 H01L21/28
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