发明名称 |
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition |
摘要 |
A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
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申请公布号 |
US6746722(B2) |
申请公布日期 |
2004.06.08 |
申请号 |
US20020198958 |
申请日期 |
2002.07.22 |
申请人 |
NEC CORPORATION |
发明人 |
MAEDA KATSUMI;NAKANO KAICHIRO |
分类号 |
G03F7/039;C07D207/452;C08F22/40;C08F222/18;C08F222/22;C08F222/40;C08F232/04;H01L21/027;(IPC1-7):C08J7/04;C08F26/06;C07D207/444 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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