发明名称 Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition
摘要 A lithographic projection apparatus which uses one, and optionally also two or more color interferometric devices to accurately determine the position of a movable table within the apparatus. The apparatus comprises a purge gas source to supply purge gas to a space accommodating at least a part of said movable table, the purge gas being selected such that leakage of the purge gas into the area of operation of the interferometric devices does not cause significant error in the interferometric measurements.
申请公布号 US6747729(B2) 申请公布日期 2004.06.08
申请号 US20010899566 申请日期 2001.07.06
申请人 ASML NETHERLANDS B.V. 发明人 PRIL WOUTER ONNO;HENSHAW PHILIP DENNIS;VAN DE PASCH ENGELBERTUS ANTONIUS FRANSISCUS;BEEMS MARCEL HENDRIKUS MARIA
分类号 C01B23/00;G03F7/20;(IPC1-7):G03B27/52;G03B27/42 主分类号 C01B23/00
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