APPARATUS FOR MANUFACTURING FPD

摘要

PURPOSE: An apparatus is provided to allow for a uniform film formation or etching process without spotting a substrate by preventing temperature and potential differences between the portions with and without elevating pins. CONSTITUTION: An apparatus comprises a substrate support(36) having a plurality of vertical through holes each of which has a top shaped as an inverse cone, wherein the substrate support permits a glass substrate(40) to be disposed on the substrate support in such a manner that the glass substrate is parallel to the substrate support; and elevating pins(32) inserted in the through holes in such a manner that the elevating pins are movable in a vertical direction so as to lift the glass substrate from the substrate support or put the glass substrate on the substrate support, wherein each of the elevating pins has a top shaped as an inverse cone corresponding to the shape of the top of the through hole.