X-RAY MASK AND FABRICATING METHOD THEREOF

摘要

PURPOSE: A method for fabricating an X-ray mask is provided to pattern a sharp and clear V-groove on a specimen such that the edge and angle of the V-groove is not warped or sagged by fabricating an X-ray mask in which an X-ray absorber for absorbing the X-ray radiated from the outside is of a trapezoid type. CONSTITUTION: A plating base layer and the first photoresist layer are sequentially formed on a substrate. The first photoresist layer is patterned to expose a part of the plating base layer. The first X-ray absorber is formed on the exposed plating base layer. The second photoresist layer is formed on the residual first photoresist layer and the first X-ray absorber. The second X-ray absorber is formed on the first X-ray absorber exposed by patterning the second photoresist layer wherein the upper part of both side surfaces of the second X-ray absorber is slightly tilted. The residual first photoresist layer and the second photoresist layer left after patterning the second photoresist layer are eliminated to expose a part of the plating base layer and eliminate the exposed plating base layer.