METHOD FOR MANUFACTURING DEVICE HAVING REFLECTIVE MASK AND COMPUTER PROGRAM THEREOF

摘要

PURPOSE: A device manufacturing method and a computer program thereof are provided to improve an imaging characteristic of the device by using a reflective mask and an inclined light source. CONSTITUTION: A substrate is provided. At least a portion of the substrate is covered with a radiation resistive layer. A projection beam(PB) of the radiation is provided by using a radiation system. A pattern is provided to a cross-section of the projection beam by using a reflective mask(MA) on which the pattern is formed by a thick radiation absorber. The patterned beam is projected on a target point(C) of the radiation resistive layer. A system aberration in the projection system is controlled to compensate for mask-induced imaging artifacts. the radiation absorber is thick relative to a wavelength of the patterned beam of radiation.