| 摘要 |
PURPOSE: Provided is a liquid composition for etching a metallic thin film pattern comprising silver a principal component with high precision, forming an excellent pattern shape and having excellent practicability at the same time. CONSTITUTION: In a liquid composition for etching a metallic thin film comprising silver a principal component, the liquid composition is obtained by blending 40 to 50 wt.% of phosphoric acid, 1.5 to 3.5 wt.% of nitric acid, 25 to 40 wt.% of acetic acid, and water, wherein the metallic thin film is silver (Ag), silver (Ag)-palladium (Pd) alloy, or silver (Ag)-palladium (Pd)-copper (Cu) alloy.
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