发明名称 |
MISALIGNMENT CHECK METHOD ENABLING TO ALTER EXPOSURE APPARATUS |
摘要 |
PURPOSE: A misalignment check method enabling to alter exposure apparatus is provided to improve productivity by using KLA equipment that is altered by Q-200 equipment. CONSTITUTION: In the misalignment check method using a compatible exposure equipment, overlay marks of a zigzag type are disposed in a scribe line(102) to determine whether the overlay mark is caused by a left shot in which the left pattern of the scribe line is formed or a right shot in which the right pattern of the scribe line is formed.
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申请公布号 |
KR20040046746(A) |
申请公布日期 |
2004.06.05 |
申请号 |
KR20020074754 |
申请日期 |
2002.11.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, HAE GYEONG |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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