发明名称 MISALIGNMENT CHECK METHOD ENABLING TO ALTER EXPOSURE APPARATUS
摘要 PURPOSE: A misalignment check method enabling to alter exposure apparatus is provided to improve productivity by using KLA equipment that is altered by Q-200 equipment. CONSTITUTION: In the misalignment check method using a compatible exposure equipment, overlay marks of a zigzag type are disposed in a scribe line(102) to determine whether the overlay mark is caused by a left shot in which the left pattern of the scribe line is formed or a right shot in which the right pattern of the scribe line is formed.
申请公布号 KR20040046746(A) 申请公布日期 2004.06.05
申请号 KR20020074754 申请日期 2002.11.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, HAE GYEONG
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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