EXPOSURE APPARATUS INCLUDING RETICLE LOADING UNIT AND RETICLE LOADING METHOD

摘要

PURPOSE: A reticle loading method is provided to shorten a time interval of a semiconductor fabricating process and improve efficiency of using an exposure apparatus by avoiding unnecessary time waste while a new reticle is loaded into a reticle stage. CONSTITUTION: A reticle is located on a reticle waiting table of an exposure apparatus before a new wafer is loaded into the exposure apparatus(S330). While the wafer is loaded, the reticle located on the reticle waiting table is loaded into a reticle stage(S340).