发明名称 |
METHOD FOR MAKING POLYANILINE THIN FILM BY USING CLUSTER BEAM DEPOSITION DEVICE |
摘要 |
PURPOSE: A method for making a polyaniline thin film by using a cluster beam deposition device is provided to obtain a polyaniline film having a uniform thickness, excellent surface roughness and a long work life is obtained. CONSTITUTION: The method for making a polyaniline thin film by using a cluster beam deposition device comprises the steps of: heating a crucible(12) containing polyaniline emeraldine base having average molecular weight of 5,000-130,000 by applying a certain electric voltage to vaporize the base; forming clusters by passing the polyaniline vapor through a nozzle disposed over the crucible(12); and depositing the polyaniline vapor on the substrate(1) at room temperature, the substrate(1) being put to earth, to produce polyaniline in a reduced form.
|
申请公布号 |
KR20040046426(A) |
申请公布日期 |
2004.06.05 |
申请号 |
KR20020074355 |
申请日期 |
2002.11.27 |
申请人 |
KOREA CHUNGANG EDUCATIONAL FOUNDATION |
发明人 |
CHOI, JONG HO;KIM, BYEONG JIN;LIM, HYEON A |
分类号 |
B29D11/00;(IPC1-7):B29D11/00 |
主分类号 |
B29D11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|