发明名称 METHOD FOR MAKING POLYANILINE THIN FILM BY USING CLUSTER BEAM DEPOSITION DEVICE
摘要 PURPOSE: A method for making a polyaniline thin film by using a cluster beam deposition device is provided to obtain a polyaniline film having a uniform thickness, excellent surface roughness and a long work life is obtained. CONSTITUTION: The method for making a polyaniline thin film by using a cluster beam deposition device comprises the steps of: heating a crucible(12) containing polyaniline emeraldine base having average molecular weight of 5,000-130,000 by applying a certain electric voltage to vaporize the base; forming clusters by passing the polyaniline vapor through a nozzle disposed over the crucible(12); and depositing the polyaniline vapor on the substrate(1) at room temperature, the substrate(1) being put to earth, to produce polyaniline in a reduced form.
申请公布号 KR20040046426(A) 申请公布日期 2004.06.05
申请号 KR20020074355 申请日期 2002.11.27
申请人 KOREA CHUNGANG EDUCATIONAL FOUNDATION 发明人 CHOI, JONG HO;KIM, BYEONG JIN;LIM, HYEON A
分类号 B29D11/00;(IPC1-7):B29D11/00 主分类号 B29D11/00
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