| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a soluble polyimide for a photosensitive polyimide precursor and the photosensitive polyimide precursor composition containing the same. <P>SOLUTION: This soluble polyimide for a photosensitive polyimide precursor is expressed by general formula 1 [X is a tetravalent aromatic or aliphatic organic group; Y is a divalent aromatic or aliphatic organic group; R<SP>1</SP>, R<SP>2</SP>are each independently a monovalent organic group expressed by CH or CH<SB>2</SB>OR<SB>3</SB>(R<SP>3</SP>is ≤6 alkyl) excluding a case of both R<SP>1</SP>, R<SP>2</SP>are H; and (m) is 10-1,000 integer], and contains reactive blocking groups at its one end or both of the ends. The photosensitive polyimide precursor composition contains the soluble polyamide, a polyamic acid containing the reactive blocking groups at its one end or both of the ends, a photo acid generator (PAG) and selectively, a dissolution suppressor. <P>COPYRIGHT: (C)2004,JPO |
